Home ProductsLFX C Series™ – Cartridge Filtration ExcellenceLFX-CUPE™ UltraPure UPE Filter Cartridges
LFX C Series™ – Cartridge Filtration Excellence

LFX-CUPE™ UltraPure UPE Filter Cartridges

FiltraCore Asia’s LFX-CUPE™ UltraPure UPE Filter Cartridges are constructed using ultra high molecular weight polyethylene UPE filter media with HDPE core, cage and support components, designed for semiconductor, ultrapure water, electronics and high purity chemical filtration applications. The UPE membrane structure provides fine particle retention, low extractables, chemical compatibility, low differential pressure and stable flow performance for demanding clean process environments.

Each cartridge is engineered for critical point of use and high purity liquid filtration, supporting reliable particle reduction in UPW loops, DI water rinse, wet process chemical filtration, photoresist and developer filtration, CMP related process streams and precision cleaning applications. The clean polymeric construction helps minimise contamination contribution while maintaining compatibility with ultrapure and chemically sensitive fluids.

LFX-CUPE™ applies a high surface area pleated UPE membrane format to deliver stable retention, predictable ΔP and consistent flow behaviour across cleanroom grade liquid systems. Cartridges are available in nanometre and sub micron ratings for applications requiring fine particle control, process stability and dependable performance in semiconductor and electronics grade fluid circuits.

Each element is designed for drop in compatibility with selected high purity UPE cartridge platforms from established global manufacturers, subject to dimensional, end cap, seal material, micron rating and application verification.

Technical Specifications

Media & Construction: Ultra high molecular weight polyethylene UPE filter media; HDPE core, cage and support components; clean polymeric construction designed for low extractables, chemical compatibility and stable ΔP.
Micron Ratings: 5 nm, 10 nm, 20 nm, 50 nm, 0.1 μm, 0.2 μm, 0.45 μm, 1 μm.
Nominal Lengths: 4 inch, 10 inch, 20 inch, 30 inch.
Diameter: Standard OD ≈ 68 mm to 69 mm, depending on configuration and replacement platform.
End Styles / Seals: DOE; SOE 222 flat. Elastomers: EPDM, TEV, E-FKM and other compatible materials on request.
Surface Area: Approximately 1.2 m² per 10 inch element.
Temperature Limits: Max operating temperature 40 °C.
Maximum Differential Pressure Forward: 3.4 bar @ 25 °C.
Maximum Differential Pressure Reverse: 2.4 bar @ 25 °C.
Quality Positioning: Cleanroom compatible design; low extractables construction; suitable for critical high purity liquid filtration where fine particle control and chemical compatibility are required.

Applications

Ultrapure water polishing in semiconductor, electronics and precision manufacturing operations.
DI water rinse filtration for clean process and high purity rinse applications.
Wet process chemical filtration for compatible acids, alkalis, solvents and process chemicals.
Photoresist and developer filtration in lithography and microelectronics manufacturing.
CMP related process filtration where UPE membrane compatibility is confirmed.
Facilities chemical filtration for high purity chemical distribution and point of use filtration.
Precision cleaning and cleanroom liquid filtration where low extractables and fine particle control are required.